Nickel Silicide Formula: Ni2Si Low Loss

Submitted by (Dr) Marie Cheynet, April 28, 2005.

Source / Purity: Thermal annealing of a Ni layer on a Si substrate

Author Comments: Analyst: Cheynet M. , Pantel R.. Temperature: Room.

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Spectrum Metadata

Specimen Name
CM20
Spectrum Type
Low Loss
Specimen Formula
Ni2Si
Data Range
-9.6 eV - 92.5 eV
Source and Purity
thermal annealing of a Ni layer on a Si substrate
Keywords
imported from old site
Alternative URL
Old EELS DB
Microscope Name / Model
CM20
Gun Type
feg
Incident Beam Energy
200 kV
Resolution
0.7 eV
Dispersion
0.1 eV/pixel
Acquisition Mode
Imaging
Convergence Semi-angle
3 mrad
Collection Semi-angle
20 mrad
Probe Size
50 nm2
Integration Time
1 secs
Number of Readouts
2
Detector
Parallel: GIF
Dark Current Correction
Yes
Gain Variation Spectrum
Yes
Relative Thickness
0.5 t/λ
Reference
Proceeding of EELS workshop EDGE 2005, 1-5 May 2005, Grundlsee Austria

The EELS Database is funded by the CEMES and IMN laboratories, by the European microscopy network ESTEEM 2, by the French microscopy network METSA and by the French microscopy society  SFµ

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